The prospects of transition metal dichalcogenides for ultimately scaled cmos – sciencedirect electricity orlando

MOSFET gate length scaling has been a main source of progress in digital electronics for decades. Today, researchers still spend considerable efforts on reducing the gate length and on developing ultimately scaled MOSFETs, thereby exploring both new device architectures and alternative channel materials beyond Silicon such as two-dimensional TMDs (transition metal dichalcogenide s). On the other hand, the envisaged scaling scenario for the next 15 years has undergone a significant change recently. While the 2013 ITRS edition required a continuation of aggressive gate length scaling for at least another 15 years, the 2015 edition of the ITRS suggests a deceleration and eventually a levelling off of gate length scaling and puts more emphasis on alternative options such as pitch scaling to keep Moore’s Law alive. In the present paper, future CMOS scaling is discussed in the light of emerging two-dimensional MOSFET channel, in particular two-dimensional TMDs. To this end, the scaling scenarios of the 2013 and 2015 ITRS editions are considered and the scaling potential of TMD MOSFETs is investigated by means of quantum–mechanical device simulations. It is shown that for ultimately scaled MOSFETs as required in the 2013 ITRS, the heavy carrier effective masses of the Mo- and W-based TMDs are beneficial for the suppression of direct source-drain tunneling, while to meet the significantly relaxed scaling targets of the 2016 ITRS heavy-effective-mass channels are not needed.

Frank Schwierz received the Dr.-Ing. and Dr. habil. degrees from Technische Universität (TU) Ilmenau, Germany, in 1986 and 2003, respectively. Presently he serves as Privatdozent at TU Ilmenau and is Head of the RF & Nano Device Research Group. His research interests include semiconductor device physics, ultra-high-speed transistors, and novel device and material concepts for future transistor generations. At present he is particularly interested in two-dimensional electronic materials. Dr. Schwierz is conducting research projects funded by the European Community, German government agencies, and the industry. Together with partners from academia and industry he was involved in the development of the fastest Si-based transistors worldwide in the late 1990s, of Europe’s smallest MOSFETs in the early 2000s, and the fastest GaN HEMTs on Si substrates and of the fastest GaN tri-gate HEMTs worldwide in the 2010s. His recent work on two-dimensional materials made a major contribution to the current understanding of the merits and drawbacks of graphene transistors. Dr. Schwierz has published more than 260 journal and conference papers including 40 invited papers. He is author of the books Modern Microwave Transistors – Theory, Design, and Performance (J. Wiley & Sons 2003) and Nanometer CMOS (Pan Stanford Publishing 2010) and editor of the book Two-Dimensional Electronics – Prospects and Challenges (MDPI 2016). Dr. Schwierz is Senior Member of the IEEE and serves as a Distinguished Lecturer of the IEEE Electron Devices Society and as an editor of the IEEE Transactions on Electron Devices. He is listed as one of the key contributors to the Emerging Research Devices Technology Working Group of the 2013 and 2015 ITRS (International Technology Roadmap for Semiconductors) editions.